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39179
Barium tantalum oxide, 99% (metals basis)
39348
Lead(II) tantalum oxide, 99.9% (metals basis)
36574
Lithium tantalum tert-butoxide, 99.9% (metals basis), 10% w/v in tert-butanol
42344
Lithium tantalum ethoxide, 99.9% (metals basis), 5% w/v in ethanol
40520
Lithium tantalum isopropoxide, 99.9% (metals basis)
41834
Lithium tantalum oxide, 99.9% (metals basis)
39366
Magnesium tantalum oxide, 99.9% (metals basis)
42612
Molecular sieves, tantalum oxide based; mesoporous, 22 Angstrom, powder
42611
Molecular sieves, tantalum oxide based; mesoporous, 32 Angstrom, powder
42855
Pentakis(diethylamino)tantalum
39631
Pentamethylcyclopentadienyltantalum tetrachloride
45651
Potassium tantalum isopropoxide, 2.5% w/v in isopropanol
39167
Potassium tantalum isopropoxide, 5% w/v in isopropanol
12879
Potassium tantalum oxide, Puratronic®, 99.998% (metals basis)
Tantalum(V) acetylacetonate tetraethoxide, see Tantalum(V) tetraethoxide 2,4-pentanedionate, 99.99%, (metals basis)
14041
Tantalum(V) bromide, 99.9% (metals basis)
12144
Tantalum carbide, 99.5% (metals basis)
44342
Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
44341
Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
44339
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
44340
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)



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