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Gallium(III) oxide is used in vacuum deposition. It is useful for making semiconductor devices, gallium-alumina catalyst, gas sensors, luminescent phosphors and dielectric coatings of solar cells. Used as an evaporated material and sputtering target of 99.999% in dielectric films. It shows potential for developing deep-ultraviolet TCOs (Transparent Conductive Oxides) and transparent electrodes for ultraviolet optoelectronic devices. Recent studies report that gallium oxide can be a strong contender for power electronic devices for example in ultrahigh-voltage power switching applications. Films made of gallium oxide have gained commercial interest owing to their gas sensitive characteristics, and glasses made with gallium oxide are the preferred optical materials for use in advanced technologies.
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Higashiwaki, M.; Sasaki, K.; Kuramata, A.; Masui, T.; Yamakoshi, S. Development of gallium oxide power devices. Phys. Status Solidi A 2014, 211, 21-26.
Rambabu, U.; Munirathnam, N. R.; Prakash, T. L.; Vengalrao, B.; Buddhudu, S. Synthesis and Characterization of Morphologically Different High purity Gallium oxide Nanopowders. J. Mater. Sci. 2007, 42 (22), 9262-9266.
Kumar, S. S.; Rubio, E. J.; Noor-A-Alam, M.; Martinez, G.; Manandhar, S.; Shutthanandan, V.; Thevuthasan, S.; Ramana, C. V. Structure, Morphology, and Optical Properties of Amorphous and Nanocrystalline Gallium Oxide Thin Films. J. Phys. Chem. C 2013, 117 (8), 4194-4200.
Jianjun, L.; Jinliang, Y.; Liang, S.; Ting, L. Electrical and optical properties of deep ultraviolet transparent conductive Ga2O3/ITO films by magnetron sputtering. J. Semicond. 2010, 31 (10), 103001-103005.
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