Cookies disclaimer

I agree Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our website without changing the browser settings you grant us permission to store that information on your device.

1314-61-0 - Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max - 10881 - Alfa Aesar

10881 Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max

CAS-Nummer
1314-61-0
Synonyme

Größe Preis ($) Menge Verfügbarkeit
25g 112,27
100g 404,79
500g 1664,48
Zum Warenkorb hinzufügen Zur Angebotsanfrage hinzufügen Artikel anzeigen

Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max

MDL
MFCD00011254
EINECS
215-238-2

Chemische Eigenschaften

Formel
Ta2O5
Molmasse
441.89
Form
Powder
Schmelzpunkt
1800°
Dichte
8.2
Löslichkeit
Insoluble in almost all organic solvents. Solubility is negligible in water.

Anwendungen

It is used in the production of capacitors, due to its high dielectric constant. These capacitors are used in automotive electronics, cell phones, thin film components, and electronic circuitry. In addition, Tantalum(V) oxide has been utilized in the fabrication of the glass of photographic lenses. Due to its high biocompatibility and resistivity, it has attracted many biomedical applications. It is used in tantalum capacitors, resistive switching memories, high frequency CMOS (Complementary metal-oxide-semiconductors) integrated circuits, and high-k dielectric for DRAM (Dynamic random-access memory) capacitor applications. It has been shown to improve corrosion resistance and cytocompatibility of titanium substrates.

Bemerkungen

Tantalum(V) oxide reacts with strong bases and hydrofluoric acid.

Literaturverweise

Xu, G.; Shen, X.; Hu, Y.; Ma, P.; Cai, K. Fabrication of tantalum oxide layers onto titanium substrates for improved corrosion resistance and cytocompatibility. Surf. Coat. Technol. 2015, 272, 58-65.

Macionczyk, F.; Gerold, B.; Thull, R. Repassivating tantalum/tantalum oxide Surface Modification on Stainless Steel Implants. Surf. Coat. Technol. 2001, 142-144, 1084-1087.

Charlotta, A.; Bengt-Olov, M.; Margareta, S. Effect of heat treatment on the structure of L-Ta2O5. J. Solid State Chem. 2003, 176 (1), 250-258.

Weitere Referenzen

Merck
14,9056
Harmonized Tariff Code
2825.90
TSCA
Yes
RTECS
WW5855000

Empfohlen

  • 10651

    Barium sulfate, Puratronic®, 99.998% (metals basis)
  • 10716

    Iron(III) oxide, Puratronic®, 99.998% (metals basis)
  • 10822

    Niobium(V) oxide, Puratronic®, 99.9985% (metals basis)
  • 10838

    Potassium carbonate, Puratronic®, 99.997% (metals basis)
  • 13398

    Tungsten(VI) oxide, Puratronic®, 99.998% (metals basis excluding Mo), Mo 100ppm

Kürzlich angesehen

Chemikalien

Life science

Metalle und Stoffe

Katalysatoren

Forschungs- und Laborbedarf