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Terbium foil is used in the semiconductor industry as a dopant. It is also used in Physical Vapor Deposition (PVD) processes, including thermal and electron-beam (e-beam) evaporation, for the preparation of thin films.
S.Lahiri; D.Nayak; A.Ramaswami; S.Manohar. Production and separation of carrier-free lutetium, ytterbium and thulium radionuclides from 75 MeV 12C6+ irradiated terbium foil target. Journal of Radioanalytical and Nuclear Chemistry. 2000, 243, (3), 701-705
E.Lebowitz; M.W.Greene. The production of 157dy for medical use. The International Journal of Applied Radiation and Isotopes. 1971, 22, (12), 791-790
Gefahrenhinweise (EU): H228-H260
Flammable solid. In contact with water releases flammable gases which may ignite spontaneously.
Keep away from any possible contact with water, because of violent reaction and possible flash fire. Keep away from heat/sparks/open flames/hot surfaces. - No smoking. Handle under inert gas. Protect from moisture. Wear protective gloves and eye/face protection. Ground/bond container and receiving equipment. Dispose of contents/container in accordance with local/regional/national/international regulations.