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Silicon(IV) bromide is used to grow thin films of silicon by the chemical vapor deposition method. It is also used for ceramics, sealants and the production of many cutting tools.
Ómarsson, F. H.; Reynisson, B.; Brunger, M. J.; Hoshino, M.; Tanaka, H.; Limão-Vieira, P.; Ingólfsson, O. Negative ion formation through dissociative electron attachment to the group IV tetrabromides: Carbon tetrabromide, silicon tetrabromide and germanium tetrabromide. Int. J. Mass Spectrom. 2014, 365-366, 275-280.
Liu, X.; Cheng, H.; Zhao, T.; Zhang, C. Facile routes of manufacturing silicon quantum dots on a silicon wafer and their surface activation by esters of N-hydroxysuccinimide. J. Colloid Interface Sci. 2014, 426, 117-123.
Gefahrenhinweise (EU): H314-H318
Causes severe skin burns and eye damage. Causes serious eye damage.
Do not breathe dusts or mists. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF SWALLOWED: Rinse mouth. Do NOT induce vomiting. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.