I agree Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our website without changing the browser settings you grant us permission to store that information on your device.
n-Octadecyltrichlorosilane is used in semiconductor industry to form self-assembled monolayer thin films on silicon dioxide substrates. Used in molecular electronics, as thin insulating gates in Metal-Insulator-Semiconductor Field-Effect Transistors. It is also used in platinum catalyzed synthesis.
Sung, Myung M.; G. Jonathan Kluth; and Roya Maboudian. Formation of alkylsiloxane self-assembled monolayers on Si3N4. J. Vac. Sci. Technol. A. 1999, 17 (2), 1100-1106.
A. N. Parikh; M. A. Schivley; E. Koo; K. Seshadri; D. Aurentz; K. Mueller; and D. L. Allara. n-Alkylsiloxanes:? From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of n-Octadecyltrichlorosilane. J. Am. Chem. Soc. 1997, 119 (13), 3135-3143.
Gefahrenhinweise (EU): H314-H318
Causes severe skin burns and eye damage. Causes serious eye damage.
Wear protective gloves/protective clothing/eye protection/face protection. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF exposed or if you feel unwell: Immediately call a POISON CENTER/doctor Store in a dry place.