Cookies disclaimer

I agree Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our website without changing the browser settings you grant us permission to store that information on your device.

1314-61-0 - Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max - 10881 - Alfa Aesar

10881 Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max

CAS Number
1314-61-0
Synonyms

Size Price ($) Quantity Availability
25g 112.00
100g 405.00
500g 1664.00
Add to Cart Add to Quote Request View Item

Tantalum(V) oxide, Puratronic®, 99.993% (metals basis excluding Nb), Nb 50ppm max

MDL
MFCD00011254
EINECS
215-238-2

Chemical Properties

Formula
Ta2O5
Formula Weight
441.89
Form
Powder
Melting point
1800°
Density
8.2
Solubility
Insoluble in almost all organic solvents. Solubility is negligible in water.

Applications

It is used in the production of capacitors, due to its high dielectric constant. These capacitors are used in automotive electronics, cell phones, thin film components, and electronic circuitry. In addition, Tantalum(V) oxide has been utilized in the fabrication of the glass of photographic lenses. Due to its high biocompatibility and resistivity, it has attracted many biomedical applications. It is used in tantalum capacitors, resistive switching memories, high frequency CMOS (Complementary metal-oxide-semiconductors) integrated circuits, and high-k dielectric for DRAM (Dynamic random-access memory) capacitor applications. It has been shown to improve corrosion resistance and cytocompatibility of titanium substrates.

Notes

Tantalum(V) oxide reacts with strong bases and hydrofluoric acid.

Literature References

Xu, G.; Shen, X.; Hu, Y.; Ma, P.; Cai, K. Fabrication of tantalum oxide layers onto titanium substrates for improved corrosion resistance and cytocompatibility. Surf. Coat. Technol. 2015, 272, 58-65.

Macionczyk, F.; Gerold, B.; Thull, R. Repassivating tantalum/tantalum oxide Surface Modification on Stainless Steel Implants. Surf. Coat. Technol. 2001, 142-144, 1084-1087.

Charlotta, A.; Bengt-Olov, M.; Margareta, S. Effect of heat treatment on the structure of L-Ta2O5. J. Solid State Chem. 2003, 176 (1), 250-258.

Other References

Merck
14,9056
Harmonized Tariff Code
2825.90
TSCA
Yes
RTECS
WW5855000

Recommended

  • 10651

    Barium sulfate, Puratronic®, 99.998% (metals basis)
  • 10716

    Iron(III) oxide, Puratronic®, 99.998% (metals basis)
  • 10822

    Niobium(V) oxide, Puratronic®, 99.9985% (metals basis)
  • 10838

    Potassium carbonate, Puratronic®, 99.997% (metals basis)
  • 13398

    Tungsten(VI) oxide, Puratronic®, 99.998% (metals basis excluding Mo), Mo 100ppm

Recently Viewed

Chemicals

Life Science

Metals & Materials

Catalysts

Analytical & Labware