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12039-88-2 - Tungsten silicide, 99.5% (metals basis) - 11551 - Alfa Aesar

11551 Tungsten silicide, 99.5% (metals basis)

CAS Number
12039-88-2
Synonyms

Size Price ($) Quantity Availability
10g 30.69
50g 88.68
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Tungsten silicide, 99.5% (metals basis)

MDL
MFCD00049704
EINECS
234-909-0

Chemical Properties

Formula
WSi2
Formula Weight
240.02
Form
-325 Mesh Powder
Melting point
2165°
Solubility
Insoluble in water.

Applications

Tungsten silicide is used in microelectronics as a contact material. It is also used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Further, it acts as a barrier layer between silicon and other metals. In addition to this, it is used in microelectro mechanical systems and for oxidation-resistant coatings. It is also employed as a replacement for earlier tungsten films.

Notes

Incompatible with acids.

Literature References

Badran, I.; Kan, W. H.; Shi, Y. J. Structural Changes in Tungsten and Tantalum Wires in Catalytic Chemical Vapor Deposition Using 1, 3-Disilacyclobutane. J. Phys. Chem. C 2015, 119 (33), 19134-19142.

Rogowski, J.; Kubiak, A. Effects of annealing temperature on the structure and electrical properties of tungsten contacts to n-type silicon carbide. Mater. Sci. Eng., B 2015, 191, 57-65.

Other References

Harmonized Tariff Code
2850.00
TSCA
Yes

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