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Terbium foil is used in the semiconductor industry as a dopant. It is also used in Physical Vapor Deposition (PVD) processes, including thermal and electron-beam (e-beam) evaporation, for the preparation of thin films.
S.Lahiri; D.Nayak; A.Ramaswami; S.Manohar. Production and separation of carrier-free lutetium, ytterbium and thulium radionuclides from 75 MeV 12C6+ irradiated terbium foil target. Journal of Radioanalytical and Nuclear Chemistry. 2000, 243, (3), 701-705
E.Lebowitz; M.W.Greene. The production of 157dy for medical use. The International Journal of Applied Radiation and Isotopes. 1971, 22, (12), 791-790
Hazard Statements: H228-H260
Flammable solid. In contact with water releases flammable gases which may ignite spontaneously.
Precautionary Statements: P223-P210-P231+P232-P280a-P240-P501a
Keep away from any possible contact with water, because of violent reaction and possible flash fire. Keep away from heat/sparks/open flames/hot surfaces. - No smoking. Handle under inert gas. Protect from moisture. Wear protective gloves and eye/face protection. Ground/bond container and receiving equipment. Dispose of contents/container in accordance with local/regional/national/international regulations.