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Silicon tetraacetate is used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It serves as a precursor to prepare silicon complexes with monofunctional bidentate Schiff bases. It is also used as an alternative to silicon hydride and alkoxide for low-temperature silicon dioxide production. Further, it reacts with ethanol in the absence of water to get silica gel and ethyl acetate. In addition, it is employed as a sol-gel precursor.
Skoda, D.; Styskalik, A.; Moravec, Z.; Bezdicka, P.; Barnes, C. E.; Pinkas, J. Mesoporous titanosilicates by templated non-hydrolytic sol-gel reactions. J. Sol-Gel Sci. Technol. 2015, 74 (3), 810-822.
Cho, D.; Jeong, Y. Facile fabrication of porous silicon nanowires using water-based polyvinyl alcohol/silicon tetraacetate solution. Mater. Lett. 2015, 160, 503-506.
Hazard Statements: H314-H318
Causes severe skin burns and eye damage. Causes serious eye damage.
Precautionary Statements: P260u-P303+P361+P353-P305+P351+P338-P301+P330+P331-P405-P501a
Do not breathe dusts or mists. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF SWALLOWED: Rinse mouth. Do NOT induce vomiting. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.