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Silicon tetraacetate is used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It serves as a precursor to prepare silicon complexes with monofunctional bidentate Schiff bases. It is also used as an alternative to silicon hydride and alkoxide for low-temperature silicon dioxide production. Further, it reacts with ethanol in the absence of water to get silica gel and ethyl acetate. In addition, it is employed as a sol-gel precursor.
Skoda, D.; Styskalik, A.; Moravec, Z.; Bezdicka, P.; Barnes, C. E.; Pinkas, J. Mesoporous titanosilicates by templated non-hydrolytic sol-gel reactions. J. Sol-Gel Sci. Technol. 2015, 74 (3), 810-822.
Cho, D.; Jeong, Y. Facile fabrication of porous silicon nanowires using water-based polyvinyl alcohol/silicon tetraacetate solution. Mater. Lett. 2015, 160, 503-506.
Hazard Statements: H314-H335
Causes severe skin burns and eye damage. May cause respiratory irritation.
Precautionary Statements: P260-P264b-P271-P280-P301+P330+P331-P303+P361+P353-P304+P340-P305+P351+P338-P310-P363-P501c
Do not breathe dust/fume/gas/mist/vapours/spray. Wash face, hands and any exposed skin thoroughly after handling Use only outdoors or in a well-ventilated area. Wear protective gloves/protective clothing/eye protection/face protection. IF SWALLOWED: Rinse mouth. Do NOT induce vomiting. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. Immediately call a POISON CENTER or doctor/physician. Wash contaminated clothing before reuse. Dispose of contents/ container to an approved waste disposal plant