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Ni silicides have been widely investigated for contact materials in microelectronic devices. Electroplating is another major use of the metal. nickel silicide/silicon nanowire heterostructures have been used to produce field-effect transistors.
J.O. Olowolafe,; M.-A. Nicolet,; J.W. Mayer.Influence of the nature of the Si substrate on nickel silicide formed from thin Ni films. Thin Solid Films. 1976 , 38(2) , 161-166
Hazard Statements: H317-H350i-H372
May cause an allergic skin reaction. May cause cancer by inhalation. Causes damage to organs through prolonged or repeated exposure.
Precautionary Statements: P201-P202-P260-P264b-P270-P272-P280g-P281-P302+P352-P308+P313-P333+P313-P363-P501c
Obtain special instructions before use. Do not handle until all safety precautions have been read and understood. Do not breathe dust/fume/gas/mist/vapours/spray. Wash face, hands and any exposed skin thoroughly after handling Do not eat, drink or smoke when using this product. Contaminated work clothing should not be allowed out of the workplace. Wear protective gloves. Use personal protective equipment as required. IF ON SKIN: Wash with plenty of soap and water. IF exposed or concerned: Get medical advice/attention. If skin irritation or rash occurs: Wash contaminated clothing before reuse. Dispose of contents/ container to an approved waste disposal plant