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40829 Aluminum sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

CAS Number
7429-90-5
Synonyms

Stock No. Size Price ($) Quantity Availability
40829-KS 1each 353.00
40829-KU 5each 1588.00
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Aluminum sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

MDL
MFCD00134029
EINECS
231-072-3

Chemical Properties

Storage & Sensitivity
Ambient temperatures.
Solubility
Insoluble in water.

Applications

Photograph of the aluminum sputtering target. Superimposed on the photograph are the annular area (shaded) used to approximate the sputter- ing area in calculating sputtered flux using Eq. Arc generation from sputtering plasma-dielectric inclusion interactions explains the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets.

Notes

Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

Literature References

C. E. Wickersham Jr.,; J. E. Poole1,; J. S. Fan. Arc generation from sputtering plasma-dielectric inclusion interactions . J. Vac. Sci. Technol. 2002 , A20/span>833.

C. E. Wickersham Jr. Crystallographic target effects in magnetron sputtering . J. Vac. Sci. Technol. . 1987, A5 1755

Other References

Harmonized Tariff Code
8543.90
TSCA
Yes

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