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40842 Chromium sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

CAS Number
7440-47-3
Synonyms

Stock No. Size Price ($) Quantity Availability
40842-KS 1each 350.00
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Chromium sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

MDL
MFCD00010944
EINECS
231-157-5

Chemical Properties

Storage & Sensitivity
Ambient temperatures.
Solubility
Insoluble in water.

Applications

Chromium sputtering target is commonly used for thin-film deposition, etching and analytical techniques. And It is also used as Magnetron sputtering source.

Notes

Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

Literature References

Audronis, M.; Kelly, P.J.; Arnell, R.D.; Valiulis, A.V. Pulsed magnetron sputtering of chromium boride films from loose powder targets. Surface and Coatings Technology. 2006, 200, (14-15), 4166-4173.

Other References

Harmonized Tariff Code
8543.90
TSCA
Yes

Recommended

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