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Chromium sputtering target is commonly used for thin-film deposition, etching and analytical techniques. And It is also used as Magnetron sputtering source.
Audronis, M.; Kelly, P.J.; Arnell, R.D.; Valiulis, A.V. Pulsed magnetron sputtering of chromium boride films from loose powder targets. Surface and Coatings Technology. 2006, 200, (14-15), 4166-4173.