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40864 Manganese sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

CAS Number
7439-96-5
Synonyms

Stock No. Size Price ($) Quantity Availability
40864-KS 1each 891.00
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Manganese sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

MDL
MFCD00011111
EINECS
231-105-1

Chemical Properties

Form
Hot pressed
Storage & Sensitivity
Ambient temperatures.
Solubility
Insoluble in water.

Applications

Manganese sputtering target is widely used in coating processing industries like magnetic data storage application, electronic and semiconductor application. It is used also in chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical applications.

Notes

Thickness tolerance: ^+0.015in; Diameter tolerance: ^+0.020in

Literature References

J.N Broughton.; M.J Brett. Investigation of thin sputtered Mn films for electrochemical capacitors. Electrochimica Acta. 2004, 49, (25), 4439-4446.

Precautionary Statements:

Other References

Harmonized Tariff Code
8543.90
TSCA
Yes

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