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Silicon sputtering target in ultra high purity silicon is used in the semiconductor industry as a result of its semiconducting properties. It is used as an alloying element in the manufacture of certain alloys (e.g. ferrosilicon, an alloy of iron and silicon which is used to introduce silicon into steel and cast iron). It is also used in the manufacture of glass and computer microchips.
P. C. Zalm. Energy dependence of the sputtering yield of silicon bombarded with neon, argon, krypton, and xenon ions. J. Appl. Phys. 1983, 54 2660.
Hazard Statements: H303
May be harmful if swallowed.
Precautionary Statements: P312a
Call a POISON CENTER/doctor if you feel unwell.