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40893 Silicon sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

CAS Number
7440-21-3
Synonyms

Stock No. Size Price ($) Quantity Availability
40893-KS 1each 375.00
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Silicon sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)

MDL
MFCD00085311
EINECS
231-130-8

Chemical Properties

Storage & Sensitivity
Ambient temperatures.
Solubility
Insoluble in water.

Applications

Silicon sputtering target in ultra high purity silicon is used in the semiconductor industry as a result of its semiconducting properties. It is used as an alloying element in the manufacture of certain alloys (e.g. ferrosilicon, an alloy of iron and silicon which is used to introduce silicon into steel and cast iron). It is also used in the manufacture of glass and computer microchips.

Notes

Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

Literature References

Andersen, H.L.; Bay, H.L.; Andersen, H.H.; Bay, H.L. Sputtering-yield studies on silicon and silver targets. Radiation Effects. 1973, 19, (3), 139-146 .

GHS Hazard and Precautionary Statements

Hazard Statements: H303

May be harmful if swallowed.

Precautionary Statements: P312a

Call a POISON CENTER/doctor if you feel unwell.

Other References

Harmonized Tariff Code
2804.61
TSCA
Yes

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