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43039 Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)

CAS Number
7440-50-8
Synonyms

Stock No. Size Price ($) Quantity Availability
43039-KS 1each 266.00
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Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)

MDL
MFCD00010965
EINECS
231-159-6

Chemical Properties

Storage & Sensitivity
Ambient temperatures.
Solubility
Insoluble in water.

Applications

Sputtering targets commonly used to coat electronic components and electronic instruments. Due to its high electrical conductivity, copper is becoming increasingly popular for use in large-format, high-resolution TFT-LCD television sets. Copper is used as the electrode layer in thin-film transistors.

Notes

Thickness tolerance: ^+0.015in. Diameter tolerance: +0.020/-0.0in

Literature References

Toshiaki Okabayashi; Yuki Nakaoka; Emi Yamazaki; Millimeter- and submillimeter-wave spectroscopy of AuF in the ground Full-size image (<1 K) state. Chemical Physics Letters. 2002, 366(3-4), 406-411.

M. J. Rocke. Effects of residual gas control in relationship with sputtered aluminum film morphology and electromigration properties in fine-line very large scale integrated structures. J. Vac. Sci. Technol. A. 1988, 6(3), 1675 .

Other References

Harmonized Tariff Code
8543.90
TSCA
Yes

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