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n-Hexylphosphonic acid is used in the manufacturing of nanoparticles such as quantum dots, nano-metals and nano-ceramics. It is also used for coating of many materials, including nanoparticles by condensed hydrophobic monolayers.
Jin, C.; Zhang, X.; Wu, X.; Zhang, M.; Jiang, J.; Lin, C.; Wang, L. The recognition of n-alkyl phosphonic or carboxylic acid by mono-squaramide-functionalised pillararenes. Supramol. Chem. 2015, 27 (5-6), 329-335.
Tong, S. W.; Mishra, N.; Su, C. L.; Nalla, V.; Wu, W.; Ji, W.; Zhang, J.; Chan, Y.; Loh, K. P. High-Performance Hybrid Solar Cell Made from CdSe/CdTe Nanocrystals Supported on Reduced Graphene Oxide and PCDTBT. Adv. Funct. Mater. 2014, 24 (13), 1904-1910.
Hazard Statements: H315-H319-H335
Causes skin irritation. Causes serious eye irritation. May cause respiratory irritation.
Precautionary Statements: P261-P264b-P271-P280-P302+P352-P304+P340-P305+P351+P338-P312-P332+P313-P337+P313-P362-P501c
Avoid breathing dust/fume/gas/mist/vapours/spray. Wash face, hands and any exposed skin thoroughly after handling Use only outdoors or in a well-ventilated area. Wear protective gloves/protective clothing/eye protection/face protection. IF ON SKIN: Wash with plenty of soap and water. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. Call a POISON CENTER or doctor/physician if you feel unwell. If skin irritation occurs: Get medical advice/attention. If eye irritation persists: Take off contaminated clothing and wash before reuse. Dispose of contents/ container to an approved waste disposal plant