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n-Hexylphosphonic acid is used in the manufacturing of nanoparticles such as quantum dots, nano-metals and nano-ceramics. It is also used for coating of many materials, including nanoparticles by condensed hydrophobic monolayers.
Jin, C.; Zhang, X.; Wu, X.; Zhang, M.; Jiang, J.; Lin, C.; Wang, L. The recognition of n-alkyl phosphonic or carboxylic acid by mono-squaramide-functionalised pillararenes. Supramol. Chem. 2015, 27 (5-6), 329-335.
Tong, S. W.; Mishra, N.; Su, C. L.; Nalla, V.; Wu, W.; Ji, W.; Zhang, J.; Chan, Y.; Loh, K. P. High-Performance Hybrid Solar Cell Made from CdSe/CdTe Nanocrystals Supported on Reduced Graphene Oxide and PCDTBT. Adv. Funct. Mater. 2014, 24 (13), 1904-1910.
Hazard Statements: H315-H319-H335
Causes skin irritation. Causes serious eye irritation. May cause respiratory irritation.
Precautionary Statements: P261-P280a-P305+P351+P338-P304+P340-P405-P501a
Avoid breathing dust/fume/gas/mist/vapours/spray. Wear protective gloves and eye/face protection. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.