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Trimethyl(methylcyclopentadienyl)platinum(IV) is used as an organometallic precursor for platinum. It is used in the microelectronics, catalysis, photonics and chemical sensing processes. It is used for the deposition of ultrathin metallic layers of platinum by the electron beam induced deposition process.
Wnuk, J. D.; Gorham, J. M.; Rosenberg, S. G.; van Dorp, W. F.; Madey, T. E.; Hagen, C. W.; Fairbrother, D. H. Electron induced surface reactions of the organometallic precursor trimethyl (methylcyclopentadienyl) platinum(IV). J. Phys. Chem. C 2009, 113 (6), 2487-2496.
Engmann, S.; Stano, M.; Matejcik, S.; Ingólfsson, O. Gas phase low energy electron induced decomposition of the focused electron beam induced deposition (FEBID) precursor trimethyl (methylcyclopentadienyl) platinum(iv)(MeCpPtMe3). Phys. Chem. Chem. Phys. 2012, 14 (42), 14611-14618.