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n-Octadecyltrichlorosilane is used in semiconductor industry to form self-assembled monolayer thin films on silicon dioxide substrates. Used in molecular electronics, as thin insulating gates in Metal-Insulator-Semiconductor Field-Effect Transistors. It is also used in platinum catalyzed synthesis.
Sung, Myung M.; G. Jonathan Kluth; and Roya Maboudian. Formation of alkylsiloxane self-assembled monolayers on Si3N4. J. Vac. Sci. Technol. A. 1999, 17 (2), 1100-1106.
A. N. Parikh; M. A. Schivley; E. Koo; K. Seshadri; D. Aurentz; K. Mueller; and D. L. Allara. n-Alkylsiloxanes:? From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of n-Octadecyltrichlorosilane. J. Am. Chem. Soc. 1997, 119 (13), 3135-3143.
Hazard Statements: H314-H335
Causes severe skin burns and eye damage. May cause respiratory irritation.
Precautionary Statements: P260-P264b-P271-P280-P301+P330+P331-P303+P361+P353-P304+P340-P305+P351+P338-P310-P363-P501c
Do not breathe dust/fume/gas/mist/vapours/spray. Wash face, hands and any exposed skin thoroughly after handling Use only outdoors or in a well-ventilated area. Wear protective gloves/protective clothing/eye protection/face protection. IF SWALLOWED: Rinse mouth. Do NOT induce vomiting. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. Immediately call a POISON CENTER or doctor/physician. Wash contaminated clothing before reuse. Dispose of contents/ container to an approved waste disposal plant