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n-Octadecyltrichlorosilane is used in semiconductor industry to form self-assembled monolayer thin films on silicon dioxide substrates. Used in molecular electronics, as thin insulating gates in Metal-Insulator-Semiconductor Field-Effect Transistors. It is also used in platinum catalyzed synthesis.
Sung, Myung M.; G. Jonathan Kluth; and Roya Maboudian. Formation of alkylsiloxane self-assembled monolayers on Si3N4. J. Vac. Sci. Technol. A. 1999, 17 (2), 1100-1106.
A. N. Parikh; M. A. Schivley; E. Koo; K. Seshadri; D. Aurentz; K. Mueller; and D. L. Allara. n-Alkylsiloxanes:? From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of n-Octadecyltrichlorosilane. J. Am. Chem. Soc. 1997, 119 (13), 3135-3143.
Hazard Statements: H314-H318
Causes severe skin burns and eye damage. Causes serious eye damage.
Precautionary Statements: P280-P305+P351+P338-P309-P310a-P402
Wear protective gloves/protective clothing/eye protection/face protection. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF exposed or if you feel unwell: Store in a dry place.