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Employed as a Chemical Vapor Deposition (CVD) precursor to germanium oxide thin films.
M Gazicki.; R Ledzion.; R Mazurczyk.; S Pawłowski. Deposition and properties of germanium/carbon films deposited from tetramethylgermanium in a parallel plate RF discharge.Thin Solid Films.,1998,322(1-2), 123-131.
Tetsuya Hattori.; Shigeru Semura and Nobuhiro Akasaka. Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition of SiO2 and GeO2?SiO2 Films for Optical Waveguides Using Tetraethylorthosilicate and Tetramethylgermanium.The Japan Society of Applied Physics.,1999,38(5A).
Hazard Statements: H225-H302-H312-H332
Highly flammable liquid and vapour. Harmful if swallowed. Harmful in contact with skin. Harmful if inhaled.
Precautionary Statements: P210-P261-P280-P303+P361+P353-P304+P340-P501a
Keep away from heat/sparks/open flames/hot surfaces. - No smoking. Avoid breathing dust/fume/gas/mist/vapours/spray. Wear protective gloves/protective clothing/eye protection/face protection. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. Dispose of contents/container in accordance with local/regional/national/international regulations.