I agree Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our website without changing the browser settings you grant us permission to store that information on your device.
Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
Toshiro Maruyama,; Toshimasa Shirai. Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone. Appl. Phys. Lett. 1993, 63(5),611.
Y. W. Bae,; W. Y. Lee,; T. M. Besmann,; P. J. Blau.Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia. Appl. Phys. Lett. 1995 , 66(15) , 1895.
Hazard Statements: H226-H261-H302-H312-H314-H318
Flammable liquid and vapour. In contact with water releases flammable gas. Harmful if swallowed. Harmful in contact with skin. Causes severe skin burns and eye damage. Causes serious eye damage.
Precautionary Statements: P260-P201-P280-P304+P340-P405-P501a
Do not breathe dust/fume/gas/mist/vapours/spray. Obtain special instructions before use. Wear protective gloves/protective clothing/eye protection/face protection. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.