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Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
Toshiro Maruyama,; Toshimasa Shirai. Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)silane and ozone. Appl. Phys. Lett. 1993, 63(5),611.
Y. W. Bae,; W. Y. Lee,; T. M. Besmann,; P. J. Blau.Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia. Appl. Phys. Lett. 1995 , 66(15) , 1895.
Hazard Statements: H226-H261-H302-H312-H314-H318
Flammable liquid and vapour. In contact with water releases flammable gas. Harmful if swallowed. Harmful in contact with skin. Causes severe skin burns and eye damage. Causes serious eye damage.
Precautionary Statements: P280-P303+P361+P353-P305+P351+P338-P310a-P402
Wear protective gloves/protective clothing/eye protection/face protection. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. Immediately call a POISON CENTER/doctor Store in a dry place.