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Search Results

Your search results for 7631-86-9

  • Silica gel 60, 0.032-0.063mm (230-450 mesh)

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Suitable for conventional and flash column chromatography.

    Marchenko, M.; Thomson, A.; Ellis, T. N.; Knuckley, B.; Causey, C. P. Development of a clickable activity-based protein profiling (ABPP) probe for agmatine deiminases. Bioorg. Med. Chem. 2015, 23 (9), 2159-2167.

    Thomson, A.; O’Connor, S.; Knuckley, B.; Causey, C. P. Design, synthesis, and in vitro evaluation of an activity-based protein profiling (ABPP) probe targeting agmatine deiminases. Bioorg. Med. Chem. 2014, 22 (17), 4602-4608.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, S.A. 130-170m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, S.A. 300-350m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    He, Y.; Lu, L.; Struble, L. J.; Rapp, J. L.; Mondal, P.; Hu, S. Effect of calcium-silicon ratio on microstructure and nanostructure of calcium silicate hydrate synthesized by reaction of fumed silica and calcium oxide at room temperature. Mater. Struct. 2014, 47 (1-2), 311-322.

    Wang, Q. Q.; Qu, J.; Liu, Y.; Gui, C. X.; Hao, S. M.; Yu, Y.; Yu, Z. Z. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Nanoscale 2015, 7 (40), 16805-16811.

    Nandiyanto, A. B. D.; Kim, S. G.; Iskandar, F.; Okuyama, K. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Micropor. Mesopor. Mat. 2009, 120 (3), 447.

    Structure image
  • Silica gel 60, 0.062-0.105mm (150-230 mesh)

    CAS: 7631-86-9

    [7631-86-9], -150+230 Mesh, S.A. 500-600m2/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Queiroz, M. J. R. P.; Calhelha, R. C.; Kirsch, G. Reactivity of several deactivated 3-aminobenzo[b]thiophenes in the Buchwald-Hartwig C-N coupling. Scope and limitations. Tetrahedron 2015, 63 (52), 13000-13005.

    Albuquerque, M. R. J. R.; Silveira, E. R.; Uchôa, D. E. D. A.; Lemos, T. L. G.; Souza, E. B.; Santiago, G. M. P.; Pessoa, O. D. L. Chemical Composition and Larvicidal Activity of the Essential Oils from Eupatorium betonicaeforme (D.C.) Baker (Asteraceae). J. Agric. Food Chem. 2004, 52 (22), 6708-6711.

    Structure image
  • Silicon(IV) oxide, amorphous, nanopowder, 99.5% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiOx, (x=1.2-1.6), 10-20nm APS Powder, m.p. 1710°, b.p. 2230°, d. 2.4, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H373

    Precautionary Codes: P260-P314-P403-P501c

    G. Adam.; A. Šebenik.; U. Osredkar.; Z. Veksli.; F. Ranogajec. Grafting of Waste Rubber. Rubber Chem. Technol. 1990, 63 (5),660-668..

    Structure image
  • Silicon(IV) oxide, powder, 1.0 micron, 99.9%

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, m.p. 1710°, b.p. 2230°, d. 2.0, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Linards Skuja. Optically active oxygen-deficiency-related centers in amorphous silicon dioxide. Journal of Non-Crystalline Solids. 1998, 239 (1-3), 16-48.

    Nathan S. Jacobson.; Kang N. Lee.; Dennis S. Fo. Reactions of Silicon Carbide and Silicon(IV) Oxide at Elevated Temperatures. Journal of the American Ceramic Society. 1992, 75 (6), 1603-1611.

    High purity, spherical silica powder of narrow particle size distribution.

    Structure image
  • Silica gel 60, 0.075-0.2mm (70-200 mesh)

    CAS: 7631-86-9

    [7631-86-9], -70+200 Mesh Powder, S.A. 470-570m2/g, m.p. 1710°, b.p. 2230°, d. 2.4, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Queiroz, M. J. R. P.; Calhelha, R. C.; Kirsch, G. Reactivity of several deactivated 3-aminobenzo[b]thiophenes in the Buchwald-Hartwig C-N coupling. Scope and limitations. Tetrahedron 2015, 63 (52), 13000-13005.

    Albuquerque, M. R. J. R.; Silveira, E. R.; Uchôa, D. E. D. A.; Lemos, T. L. G.; Souza, E. B.; Santiago, G. M. P.; Pessoa, O. D. L. Chemical Composition and Larvicidal Activity of the Essential Oils from Eupatorium betonicaeforme (D.C.) Baker (Asteraceae). J. Agric. Food Chem. 2004, 52 (22), 6708-6711.

    Structure image
  • Silica gel 60, 0.019-0.037mm (400-600 mesh)

    CAS: 7631-86-9

    [7631-86-9], -400+600 Mesh Powder, S.A. 500-600m2/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Queiroz, M. J. R. P.; Calhelha, R. C.; Kirsch, G. Reactivity of several deactivated 3-aminobenzo[b]thiophenes in the Buchwald-Hartwig C-N coupling. Scope and limitations. Tetrahedron 2015, 63 (52), 13000-13005.

    Albuquerque, M. R. J. R.; Silveira, E. R.; Uchôa, D. E. D. A.; Lemos, T. L. G.; Souza, E. B.; Santiago, G. M. P.; Pessoa, O. D. L. Chemical Composition and Larvicidal Activity of the Essential Oils from Eupatorium betonicaeforme (D.C.) Baker (Asteraceae). J. Agric. Food Chem. 2004, 52 (22), 6708-6711.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, surface treated, S.A. 205-245m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 mesh powder, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Structure image
  • Silicon(IV) oxide, 30% in Ethylene glycol, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 0.1 Micron Particles, in Liquid, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H302-H373

    Precautionary Codes: P201-P202-P260-P264b-P270-P281-P301+P312-P308+P313-P330-P403-P501c

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, 50% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 0.02 Micron Particles, in Liquid, S.A. 180m2/g, d. 1.40, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Anoop Gupta,; Mark T. Swihart1,; Hartmut Wiggers.Luminescent Colloidal Dispersion of Silicon Quantum Dots from Microwave Plasma Synthesis: Exploring the Photoluminescence Behavior Across the Visible Spectrum. Advanced Functional Materials. 2009, 19 (5) ,696-703.

    Structure image
  • Silica gel desiccant, -6+12 mesh granules

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Sultan, M.; El-Sharkawy, I. I.; Miyazaki, T.; Saha, B. B.; Koyama, S. An overview of solid desiccant dehumidification and air conditioning systems. Renewable Sustainable Energy Rev. 2015, 46, 16-29.

    Ruivo, C. R.; Angrisani, G.; Minichiello, F. Influence of the rotation speed on the effectiveness parameters of a desiccant wheel: An assessment using experimental data and manufacturer software. Renewable Energy 2015, 76, 484-493.

    Structure image
  • Silica gel 60, 0.040-0.063mm (230-400 mesh)

    CAS: 7631-86-9

    [7631-86-9], -230+400 Mesh, S.A. 500-600m2/g, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H373

    Precautionary Codes: P260-P314-P501a

    Structure image
  • Silica gel 60, 0.036-0.071mm (215-400 mesh)

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Suitable for conventional and flash column chromatography.

    Khatry, S.; Sood, N.; Arora, S. Surface solid dispersion-a review. Int. J. Pharm. Sci. Nanotech. 2013, 6 (1), 1915-24.

    Ray, D.; Mittal, N.; Chung, W. J. Phosphorous pentoxide mediated synthesis of 5-HMF in ionic liquid at low temperature. Carbohydr. Res. 2011, 346 (14), 2145-2148.

    Structure image
  • Silicon(IV) oxide, powder, 0.5 micron, 99.9%

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, m.p. 1710°, b.p. 2230°, d. 2.0, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    High purity, spherical silica powder of narrow particle size distribution.

    Ojovan, M. I. Glass formation in amorphous SiO2 as a percolation phase transition in a system of network defects. J. Exp. Theor. Phys. Lett. 2004, 79 (12), 632-634.

    Nandiyanto, A. B. D.; Kim, S. G.; Iskandar, F.; Okuyama, K. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Micropor. Mesopor. Mat. 2009, 120 (3), 447.

    Structure image
  • Silicon(IV) oxide, 15% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.004 Micron Particles, in Liquid, S.A. 650m2/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Trukhin, A. N.; Smits, K.; Jansons, J.; Berzins, D.; Chikvaidze, G.; Griscom, D. L. UV and Yellow Luminescence in Phosphorus Doped Crystalline and Glassy Silicon Dioxide. J. Lumin. 2015, 166, 346-355.

    Neofotistou, E.; Demadis, K. D. Cationic polymeric chemical inhibitors and multifunctional blends for the control of silica scale in process waters. Int. J. Corros. Scale Inhib. 2014, 3 (1), 28-34.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, S.A. 175-225m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, 30% in Ethylene glycol, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.05 Micron Particles, in Liquid, d. 1.3, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H302-H373

    Precautionary Codes: P201-P202-P260-P264b-P270-P281-P301+P312-P308+P313-P330-P403-P501c

    Structure image
  • Silica gel desiccant, -3+8 Mesh Granules

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Ge, T. S.; Dai, Y. J.; Wang, R. Z.; Li, Y. Performance of two-stage rotary desiccant cooling system with different regeneration temperatures. Energy 2015, 80, 556-566.

    Al-Alili, A.; Hwang, Y.; Radermacher, R. Performance of a desiccant wheel cycle utilizing new zeolite material: Experimental investigation. Energy 2015, 81, 137-145.

    Structure image
  • Silica gel, large pore, 99.5%

    CAS: 7631-86-9

    [7631-86-9], +8 Mesh, S.A. 300m2/g, P.V. ≈1cc/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Mark W. Chase; and Harold H. Hills.Silica Gel: An Ideal Material for Field Preservation of Leaf Samples for DNA Studies. Taxon. 1991, 40 (2), 215-220.

    J. R. Zimmerman; W. E. Brittin. Nuclear Magnetic Resonance Studies in Multiple Phase Systems: Lifetime of a Water Molecule in an Adsorbing Phase on Silica Gel. J. Phys. Chem. 1957, 61 (10), 1328-1333.

    Structure image
  • Silicon(IV) oxide, 30% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.01 Micron Particles, in Liquid, S.A. 305m2/g, d. 1.20, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silica gel 60, 0.060-0.2mm (70-230 mesh)

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Suitable for column chromatography.

    Cho, J. Y.; Hwang, T. L.; Chang, T. H.; Lim, Y. P.; Sung, P. J.; Lee, t. H.; Chen, J. J. New coumarins and anti-inflammatory constituents from Zanthoxylum avicennae. Food Chem. 2012, 135 (1), 17-23.

    Abbasi, M. One-Pot Tandem Synthesis of β-Trimethylsilyloxy Thioesters from Thioacids, Epoxides, and HMDS Catalyzed by Silica Gel Under Solvent-Free Conditions. Synth. Commun. 2013, 43 (13), 1759-1765.

    Structure image
  • Silica gel desiccant, indicating, ACS

    CAS: 7631-86-9

    [7631-86-9], -6+18 Mesh Granules, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H350-H360-H412

    Precautionary Codes: P201-P202-P281-P308+P313-P403-P501c

    Lei, W.; Fong, N.; Yin, Y.; Svehla, M.; McKenzie, D. R. Science of Water Leaks: Validated Theory for Moisture Flow in Microchannels and Nanochannels. Langmuir 2015, 31 (42), 11740-11747.

    Ding, J.; Chen, J. Synthesis of Cu-Zn-Zr-Al-O catalysts via a citrate complex route modified by different solvents and their dehydrogenation/hydrogenation performance. RSC Adv. 2015, 5 (101), 82822-82833.

    Structure image
  • Silica gel 60, 0.040-0.063mm (230-400 mesh), 99.5% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], -230+400 Mesh, S.A. 500-600m2/g, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Park, S. H.; Park, Y. S.; Chang, S. Rhodium-Catalyzed Direct Amination of Arene C- H Bonds Using Azides as the Nitrogen Source. Org. Synth 2014, 91, 52-59.

    Kolemen, S.; Cakmak, Y.; Ozdemir, T.; Erten-Ela, S.; Buyuktemiz, M.; Dede, Y.; Akkaya, E. U. Design and characterization of Bodipy derivatives for bulk heterojunction solar cells. Tetrahedron 2014, 70 (36), 6229-6234.

    Structure image
  • Silica gel 60, with fluorescent indicator, 0.060-0.2mm (70-230 mesh)

    CAS: 7631-86-9

    [7631-86-9], -70+230 Mesh Powder, S.A. 500-600m2/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Jacques Portoukalian.; Roger Meister.; Georges Zwingelstein. Improved two-dimensional solvent system for thin-layer chromatographic analysis of polar lipids on silica gel 60 precoated plates. Journal of Chromatography A. 1978, 152, (2), 569-574.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, surface treated, S.A. 105-130m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 Mesh powder, d. 1.8, EINECS 231-545-4, RTECS EU8655000, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, 30% in Ethylene glycol, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.02 Micron Particles, in Liquid, d. 1.3, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H302-H373

    Precautionary Codes: P201-P202-P260-P264b-P270-P281-P301+P312-P308+P313-P330-P403-P501c

    Structure image
  • Silica gel desiccant, indicating, -6+16 mesh granules

    CAS: 7631-86-9

    [7631-86-9], Granules, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H350-H360-H412

    Precautionary Codes: P201-P202-P281-P308+P313-P403-P501c

    Chen, C. H.; Hsu, C. Y.; Chen, C. C.; Chen, S. L. Silica gel polymer composite desiccants for air conditioning systems. Energy Build. 2015, 101, 122-132.

    Nie, L. R.; Lu, J.; Zhang, W.; He, A.; Yao, S. Ionic liquid-modified silica gel as adsorbents for adsorption and separation of water-soluble phenolic acids from Salvia militiorrhiza Bunge. Sep. Purif. Technol. 2015, 155, 2-12.

    Structure image
  • Silicon(IV) oxide, amorphous, nanopowder, 99.9% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 20nm APS Powder, m.p. 1710°, b.p. 2230°, d. 2.4, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H373

    Precautionary Codes: P260-P314-P403-P501c

    G. Adam.; A. Šebenik.; U. Osredkar.; Z. Veksli.; F. Ranogajec. Grafting of Waste Rubber. Rubber Chem. Technol. 1990, 63 (5),660-668..

    Structure image
  • Silicon(IV) oxide, amorphous fumed, S.A. 350-420m2/g

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, -325 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, n20/D 1.46, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hiroaki Nakagami. Solid Dispersions of Indomethacin and Griseofulvin in Non-porous Fumed Silicon Dioxide, Prepared by Melting. Chemical and pharmaceutical bulletin. 1991, 39(9) 2417-2421.

    Huiping Zhang; Gail M. Annich; Judiann Miskulin; Kelly Stankiewicz; Kathryn Osterholzer; Scott I. Merz; Robert H. Bartlett; and Mark E. Meyerhoff . Nitric Oxide-Releasing Fumed Silica Particles:? Synthesis, Characterization, and Biomedical Application. J. Am. Chem. Soc. 2003, 125(17) 5015-5024.

    Structure image
  • Silicon(IV) oxide, 99.0% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, -325 Mesh Fused Amorphous Powder, S.A. 5m2/g, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    "

    Ojovan, M. I. Glass formation in amorphous SiO2 as a percolation phase transition in a system of network defects. J. Exp. Theor. Phys. Lett. 2004, 79 (12), 632-634.

    Nandiyanto, A. B. D.; Kim, S. G.; Iskandar, F.; Okuyama, K. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Micropor. Mesopor. Mat. 2009, 120 (3), 447.

    "

    Structure image
  • Silica gel, large pore

    CAS: 7631-86-9

    [7631-86-9], Powder, S.A. ≈300m2/g, P.V. ≈1.6cc/g, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Structure image
  • Silica gel 60, 0.060-0.2mm (70-230 mesh)

    CAS: 7631-86-9

    [7631-86-9], -70+230 Mesh Powder, S.A. 500-600m2/g, EINECS 231-545-4, RTECS VV7565000, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H373

    Precautionary Codes: P260-P314-P501a

    Structure image
  • Silica gel desiccant, -28+200 mesh granules

    CAS: 7631-86-9

    [7631-86-9], EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H373

    Precautionary Codes: P260-P314-P501a

    Structure image
  • Silicon(IV) oxide, powder, 1.5 micron, 99.9%

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, m.p. 1710°, b.p. 2230°, d. 2.0, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Linards Skuja. Optically active oxygen-deficiency-related centers in amorphous silicon dioxide. Journal of Non-Crystalline Solids. 1998, 239 (1-3), 16-48.

    Nathan S. Jacobson.; Kang N. Lee.; Dennis S. Fo. Reactions of Silicon Carbide and Silicon(IV) Oxide at Elevated Temperatures. Journal of the American Ceramic Society. 1992, 75 (6), 1603-1611.

    High purity, spherical silica powder of narrow particle size distribution.

    Structure image
  • Silicon(IV) oxide, Puratronic®, 99.999% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, Powder, m.p. 1710°, b.p. 2230°, EINECS 238-878-4, RTECS VV7330000, MDL MFCD00011232, TSCA Yes

    Ojovan, M. I. Glass formation in amorphous SiO2 as a percolation phase transition in a system of network defects. J. Exp. Theor. Phys. Lett. 2004, 79 (12), 632-634.

    Nandiyanto, A. B. D.; Kim, S. G.; Iskandar, F.; Okuyama, K. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Micropor. Mesopor. Mat. 2009, 120 (3), 447.

    Structure image
  • Silicon(IV) oxide, 40% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 0.02 Micron Particles, in Liquid, d. 1.30, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Structure image
  • Silicon(IV) oxide, 99.99% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 3-12mm Fused Lump, m.p. 1710°, b.p. 2230°, d. 2.2-2.6, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    D. J. DiMaria1,; E. Cartier,; D. Arnold1.Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon .J. Appl. Phys. 1989, 65 342.

    Structure image
  • Silica gel desiccant, indicating, ACS

    CAS: 7631-86-9

    [7631-86-9], -4+10 Mesh Granules, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hazard Codes: H350-H360-H412

    Precautionary Codes: P201-P202-P281-P308+P313-P403-P501c

    Nie, J.; Fang, L.; Zhang, G.; Sheng, Y.; Kong, X.; Zhang, Y.; Olesen, B. W. Theoretical study on volatile organic compound removal and energy performance of a novel heat pump assisted solid desiccant cooling system. Build. Environ. 2015, 85, 233-242.

    Zheng, X.; Wang, R. Z.; Ge, T. S.; Hu, L. M. Performance study of SAPO-34 and FAPO-34 desiccants for desiccant coated heat exchanger systems. Energy 2015, 93, 88-94.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, S.A. 85-115m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, n20/D 1.46, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Hiroaki nakagami. Solid Dispersions of Indomethacin and Griseofulvin in Non-porous Fumed Silicon Dioxide, Prepared by Melting. Chemical and Pharmaceutical Bulletin. 1991, 39, (9), 2417-2421.

    Structure image
  • Silicon(IV) oxide, amorphous fumed, surface treated, S.A. 105-145m2/g

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, -325 mesh powder, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Structure image
  • Silicon(IV) oxide, 40% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.014 Micron Particles, in Liquid, S.A. 250m2/g, d. 1.30, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, 40% in H2O, colloidal dispersion

    CAS: 7631-86-9

    [7631-86-9], O2Si, F.W. 60.09, 0.02 Micron Particles, in Liquid, S.A. 200m2/g, d. 1.30, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Precautionary Codes: P201-P202-P281-P308+P313

    Structure image
  • Silicon(IV) oxide, 99.99% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, 1-3mm Fused Lump, m.p. 1710°, b.p. 2230°, d. 2.2-2.6, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    D. J. DiMaria1,; E. Cartier,; D. Arnold1.Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon .J. Appl. Phys. 1989, 65 342.

    Structure image
  • Silicon(IV) oxide, 99.95% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, -40 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Angus I. Kingon; Jon-Paul Maria; S. K. Streiffer. Alternative dielectrics to silicon dioxide for memory and logic devices. Nature., 2000, 406 1032-10382.

    D. J. DiMaria; E. Cartier; and D. Arnold. Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon. J. Appl. Phys., 1993, 73 (7), 3367.

    Structure image
  • Silicon(IV) oxide, 99.995% (metals basis)

    CAS: 7631-86-9

    [7631-86-9], SiO2, F.W. 60.09, -40 Mesh Powder, m.p. 1710°, b.p. 2230°, d. 2.2, EINECS 231-545-4, MDL MFCD00011232, TSCA Yes

    Ojovan, M. I. Glass formation in amorphous SiO2 as a percolation phase transition in a system of network defects. J. Exp. Theor. Phys. Lett. 2004, 79 (12), 632-634.

    Nandiyanto, A. B. D.; Kim, S. G.; Iskandar, F.; Okuyama, K. Synthesis of spherical mesoporous silica nanoparticles with nanometer-size controllable pores and outer diameters. Micropor. Mesopor. Mat. 2009, 120 (3), 447.

    Structure image

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