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Sputtering Target Compounds for Evaporating and Crystal Growing Applications - Alfa Aesar

Alfa Aesar has compiled a broad representation of the more commonly used materials for evaporating and crystal growing applications. If you cannot find what you are looking for here, please contact our Specialty Sales Group to discuss your particular needs.

All purities are based on total metallic impurities unless otherwise specified. All products designated as Puratronic® or REacton® grade are automatically supplied with a Certificate of Analysis. This certificate details elements sought, detection limits and total metallic impurity levels in parts per million. Impurities are based on Total Metallic Impurities (TMI).

Tolerances for metal are normally 10% of listed value unless specifically identified.

This section contains only compound sputtering targets. Granules, pieces, pellets, wires and foils are also available for the majority of pure elements. In addition, fine powders are available for various Spraying or Pressing applications. Oxides, fluorides, pieces and lump materials can be found in the inorganics section.

Materials should always be handled with gloves. After opening, materials should be kept under an inert atmosphere to minimize oxidation. Hot pressed/hip targets should be handled with care. Bonding is suggested.

  • Aluminum oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Aluminum oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Boron carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
  • Boron carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Boron carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
  • Boron carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Boron nitride sputtering target, 25.4mm (1.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis excluding Ca)
  • Boron nitride sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Boron nitride sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Boron nitride sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Calcium fluoride sputtering target, 12.7mm (0.5in) dia x 2.5mm (0.098in) thick, 99.95% (metals basis)
  • Chromium(III) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.8% (metals basis)
  • Chromium(III) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.8% (metals basis)
  • Chromium(III) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.8% (metals basis)
  • Chromium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
  • Chromium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Chromium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) thick, 99.95% (metals basis excluding Zr)
  • Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
  • Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.25in) thick, 99.99% (metals basis)
  • Lead zirconium titanium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)
  • Lead zirconium titanium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)
  • Lead zirconium titanium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.9% (metals basis)
  • Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca)
  • Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ca)
  • Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca)
  • Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ca)
  • Molybdenum silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
  • Molybdenum silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Molybdenum silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Nickel Chromium, sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel Chromium, sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Nickel Chromium, sputtering target, 76.2in (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel Chromium, sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Nickel Iron, sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel Iron, sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Nickel Iron, sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Nickel sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Nickel sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Nickel sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Nickel Vanadium, sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel Vanadium, sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Nickel Vanadium, sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Niobium(V) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Niobium(V) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Niobium(V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Niobium(V) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Silicon carbide sputtering target, 25.4mm (1.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis excluding B)
  • Silicon carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis excluding B)

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