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Sputtering Targets Pure Elements for Evaporating and Crystal Growing Applications - Alfa Aesar

Alfa Aesar has compiled a broad representation of the more commonly used materials for evaporating and crystal growing applications. If you cannot find what you are looking for here, please contact our Specialty Sales Group to discuss your particular needs.

All purities are based on total metallic impurities unless otherwise specified. All products designated as Puratronic® or REacton® grade are automatically supplied with a Certificate of Analysis. This certificate details elements sought, detection limits and total metallic impurity levels in parts per million. Impurities are based on Total Metallic Impurities (TMI).

Tolerances for metal are normally 10% of listed value unless specifically identified.

This section contains only pure elemental sputtering targets. Granules, pieces, pellets, wires and foils are also available for the majority of pure elements. In addition, fine powders are available for various Spraying or Pressing applications. Oxides, fluorides, pieces and lump materials can be found in the inorganics section.

Materials should always be handled with gloves. After opening, materials should be kept under an inert atmosphere to minimize oxidation. Hot pressed/hip targets should be handled with care. Bonding is suggested.

  • Aluminum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Aluminum sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Aluminum sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Aluminum sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Carbon sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Carbon sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Carbon sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Cerium sputtering target, 50.8mm dia x 1.59mm thick
  • Cerium sputtering target, 50.8mm dia x 3.18mm thick
  • Cerium sputtering target, 76.2mm dia x 1.59mm thick
  • Cerium sputtering target, 76.2mm dia x 3.18mm thick
  • Chromium sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Chromium sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Chromium sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Chromium sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Cobalt sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Cobalt sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Cobalt sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Cobalt sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Copper sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis)
  • Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)
  • Copper sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Copper sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis)
  • Copper sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Copper sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)
  • Copper sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Dysprosium sputtering target, 50.8mm dia x 1.59mm thick
  • Dysprosium sputtering target, 50.8mm dia x 3.18mm thick
  • Dysprosium sputtering target, 76.2mm dia x 1.59mm thick
  • Dysprosium sputtering target, 76.2mm dia x 3.18mm thick
  • Europium sputtering target, 50.8mm dia x 1.59mm thick
  • Europium sputtering target, 50.8mm dia x 3.18mm thick
  • Europium sputtering target, 76.2mm dia x 1.59mm thick
  • Europium sputtering target, 76.2mm dia x 3.18mm thick
  • Gadolinium sputtering target, 50.8mm dia x 1.59mm thick
  • Gadolinium sputtering target, 50.8mm dia x 3.18mm thick
  • Gadolinium sputtering target, 76.2mm dia x 1.59mm thick
  • Gadolinium sputtering target, 76.2mm dia x 3.18mm thick
  • Gold sputtering target, 19.0mm (0.75in) dia x 1.5mm (0.06in) thick, 99.99% (metals basis)
  • Gold sputtering target, 25.4mm (1.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Gold sputtering target, 25.4mm (1.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Gold sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Gold sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.99% (metals basis)
  • Indium sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Indium sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
  • Indium sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)
  • Indium sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
  • Iron sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
  • Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
  • Iron sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

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