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1450-14-2 - Hexamethyldisilane, 98+% - A13155 - Alfa Aesar

A13155 Hexamethyldisilane, 98+%

Numéro CAS
1450-14-2
Synonymes

Dimensions Prix ($) Quantité Disponibilité
5g 24,82
25g 75,60
100g 265,74
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Hexamethyldisilane, 98+%

MDL
MFCD00008258
EINECS
215-911-0

Propriétés chimiques

Formule
(CH3)3SiSi(CH3)3
Poids formulaire
146.38
Point de fusion
12-13°
Point d'ébullition
112-113°
Point d'éclair
-1°(30°F)
Densité
0.721
Indice de réfraction
1.4220
Solubilité
Insoluble in water. Soluble in alcohol, ether and acetone.

Applications

Hexamethyldisilane acts as a silylating reagent for allylic acetates, aryl halides and diketones. It is a source material for vapor deposition during silicon carbide growth. It is also used in electronic and semiconducter industries.

Notes

Stable under recommended storage conditions. Incompatible with oxidizing agents, acids and bases.

Références bibliographiques

B.Beagley; J.J.Monaghan; T.G.Hewitt. Electron-diffraction studies of tetramethylsilane and hexamethyldisilane, and discussion of the lengths of Si-C bonds. Journal of Molecular Structure. 1971, 8, (4),401-411

 

M.Simon; T.Lebrun; R.Martins; G.G.B. de Souza; I.Nenner; M.Lavollee; P.Morin. Multicoincidence mass spectrometry applied to hexamethyldisilane excited around the silicon 2p edge. J. Phys. Chem. 1993, 97, (20),5228-5237

Precursor of TMSLi, TMSNa and TMSK by cleavage with alkyllithiums or alkoxides. Reaction of the metallated derivatives with aryl halides gives aryltrimethylsilanes: J. Org. Chem., 42, 2654 (1977). The anion adds 1,4-to ɑß-enones to give ß-silyl ketones: J. Org. Chem., 41, 3063 (1976); Tetrahedron Lett., 24, 3497 (1983). The anion may also be used to deoxygenate secondary nitroalkanes (to ketoximes), nitrones (to imines), and heterocyclic N-oxides: J. Org. Chem., 64, 2211 (1999).

Also cleaved by TBAF to give the "salt-free" silyl anion, which adds to aldehydes to give, after acid hydrolysis, ɑ-hydroxy silanes: J. Org. Chem., 48, 912 (1983). TBAF also catalyzes the silylation of OH groups under very mild conditions: Tetrahedron Lett., 35, 8413 (1994). See Appendix 4.

Couples with aryl, benzyl or allyl halides in the presence of Tetrakis(triphenyl­phosphine)­palladium(0)­, 10548, to give the corresponding silanes: J. Organomet. Chem., 148, 97 (1978); 225, 331 (1982).

Aryl and alkenyl nitriles undergo ipso-silylation-decyanation, catalyzed by Chloro(1,5-cyclooctadiene)­rhodium(I)­ dimer, 10466, to give the corresponding trimethylsiliyl derivatives: J. Am. Chem. Soc., 128, 8152 (2006).

Mentions de danger et de prudence du SGH

Mentions de danger (UE): H225-H319-H317-H335

Highly flammable liquid and vapour. Causes serious eye irritation. May cause an allergic skin reaction. May cause respiratory irritation.

Mentions de prudence: P210-P261-P280-P240-P241-P303+P361+P353-P305+P351+P338-P304+P340-P405-P501a

Keep away from heat/sparks/open flames/hot surfaces. - No smoking. Avoid breathing dust/fume/gas/mist/vapours/spray. Wear protective gloves/protective clothing/eye protection/face protection. Ground/bond container and receiving equipment. Use explosion-proof electrical/ventilating/lighting/ equipment. IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. IF INHALED: Remove to fresh air and keep at rest in a position comfortable for breathing. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.

Autres références

Beilstein
1633463
Classe de danger
3
Groupe d'emballage
II
Code tarifaire harmonisé
2931.90
TSCA
Yes
RTECS
JM9170000

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