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Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, as a basic solvent in the development of acidic photoresist in photolithography process, as a surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brighteners and as a cleaning agent. It is also involved in the purification of some metallic elements.
Whang, L. M.; Hu, T. H.; Liu, P. W. G.; Hung, Y. C.; Fukushima, T.; Wu, Y. J.; Chang, S. H. Molecular analysis of methanogens involved in methanogenic degradation of tetramethylammonium hydroxide in full-scale bioreactors. Appl. Microbiol. Biotechnol. 2015, 99 (3), 1485-1497.
Yin, X.; Li, Z.; Wang, S.; Chu, N.; Yang, J.; Wang, J. Hydrothermal synthesis of hierarchical zeolite T aggregates using tetramethylammonium hydroxide as single template. Microporous Mesoporous Mater. 2015, 201, 247-257.
Dichiarazioni di rischio (UE): H300-H310-H314-H318-H370-H372-H373
Fatal if swallowed. Fatal in contact with skin. Causes severe skin burns and eye damage. Causes serious eye damage. Causes damage to organs. Causes damage to organs through prolonged or repeated exposure. May cause damage to organs through prolonged or repeated exposure.
Dichiarazioni precauzionali: P260u-P301+P310a-P303+P361+P353-P305+P351+P338-P405-P501a
IF SWALLOWED: IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. Store locked up. Dispose of contents/container in accordance with local/regional/national/international regulations.